| 摘要 |
PURPOSE: A double-sided polisher and a dresser for a polishing pad applied to the same are provided to properly implement polishing performance according to the kind and state of the polishing pad by varying the shape of a segment. CONSTITUTION: A pair of tables (110,120) are rotatably installed to face each other. An inner gear (150) is rotatably formed on one center of the tables. An outer gear (160) is rotatably formed on one outer part of the tables. A pair of polishing pads (130,140) are attached to the tables to face each other and polish a wafer. A plurality of dressers (170) are installed in the diametric directions of the polishing pads to be fixed to the inner and outer gears. The dressers remove foreign materials from the surfaces of the polishing pads.
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