| 摘要 |
PROBLEM TO BE SOLVED: To obtain a microstructure suitable for a precursor of an anti-reflector, a nanoimprint, or a mold for injection molding by a single particle film etching mask in which respective particles constituting a single particle film are close packed two-dimensionally and are arrayed with high accuracy.SOLUTION: A single particle film etching mask has particles close packed two-dimensionally, and displacement D(%) of particle arrays which is defined by D(%)=|B-A|×100/A is 10% or less, where A represents an average particle size of particles and B represents an average pitch between particles in the single particle film. |
