| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition which is capable of polishing a metal at a higher speed, has high storage stability, and is capable of polishing an interlayer insulating film with little defects such as scratches, and to provide a polishing method using the same.SOLUTION: The polishing composition of the present invention is used for polishing an object to be polished having a metal or an interlayer insulating film and is characterized by containing silica on which organic acids such as a sulfonic acid and a carboxylic acid are immobilized and an oxidant. |
