发明名称 METHOD AND APPARATUS FOR PREPARING LAMELLA
摘要 Provided is a lamella preparation apparatus including an EB column (1), an FIB column (2), a reflected electron detector (5) for detecting charged particles released from a lamella (21), an input unit (10) for setting a first measurement region (41) on an upper side and a second measurement region (42) on a lower side of the lamella (21), and a calculation unit (15) for calculating a slant angle of the lamella (21) from a detected amount of the charged particles generated from the first measurement region (41) and a detected amount of the charged particles generated from the second measurement region (42) by irradiation of the electron beam (8) and a distance between the first measurement region (41) and the second measurement region (42).
申请公布号 US2013175446(A1) 申请公布日期 2013.07.11
申请号 US201213706426 申请日期 2012.12.06
申请人 SII NANOTECHNOLOGY INC.;SII NANOTECHNOLOGY INC. 发明人 NAKATANI IKUKO
分类号 H01J37/26 主分类号 H01J37/26
代理机构 代理人
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