发明名称 MATERIAL DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIALS ON A SUBSTRATE
摘要 A material deposition system includes a frame, a support coupled to the frame to support an electronic substrate during a deposit operation, a gantry coupled to the frame, and a deposition head coupled to the gantry. The deposition head is movable over the support by movement of the gantry. The deposition head includes a chamber to hold material, an actuator to push a volume of material out of the chamber, a needle extending from the chamber and terminating in a needle orifice, and at least two air jets located on opposite sides of the needle orifice. A desired volume of material is formed at the needle orifice in response to the actuator, and each of the at least two air jets produce a timed pulse of air to create a micro-droplet from the desired volume and to accelerate the micro-droplet to high velocity.
申请公布号 US2013177702(A1) 申请公布日期 2013.07.11
申请号 US201213663942 申请日期 2012.10.30
申请人 CROUCH KENNETH C.;KWOK KUI-CHIU;TRACY ROBERT W.;MOHANTY RITA;KARLINSKI THOMAS J.;REID SCOTT A. 发明人 CROUCH KENNETH C.;KWOK KUI-CHIU;TRACY ROBERT W.;MOHANTY RITA;KARLINSKI THOMAS J.;REID SCOTT A.
分类号 H05K3/00 主分类号 H05K3/00
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