| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive composition simultaneously satisfying high resolution properties (high resolving power etc.), high sensitivity, preferable pattern shapes and preferable exposure latitude (EL), an actinic ray-sensitive or radiation-sensitive film using the same, a pattern forming method, a manufacturing method of an electronic device, an electronic device and a resin.SOLUTION: There are provided an actinic ray-sensitive or radiation-sensitive composition containing a compound (P) having a phenolic hydroxyl group and a group substituted by a group represented by the specified general formula (1) for the hydrogen atom in a phenolic hydroxyl group, an actinic ray-sensitive or radiation-sensitive film using the same, a pattern forming method, a manufacturing method of an electronic device, an electronic device and a resin. |
