| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask which resolves a pattern of 3 μm or less, for instance, incapable of being resolved under exposure conditions of an alligner used in conventional manufacturing processes of a liquid crystal display device, and obtains a more precise transfer image.SOLUTION: The photomask comprises a light transmitting portion;and a semitransmitting portion which have a predetermined pattern formed thereon by patterning a semitransmitting film formed on a transparent substrate, and forms a transfer pattern having a line width of less than 3 μm on a body to be transferred by exposure light having transmitted through the photomask. The semitransmitting film has a phase difference between exposure light transmitting through the semitransmitting portion and exposure light transmitting through the light transmitting portion of 60 degrees or less. The photomask includes a pattern formed of a light transmitting portion and a semitransmitting portion including a portion having a line width of less than 3 μm in at least one of the transmitting portion and the semitransmitting portion. |
