ATOMIC LAYER DEPOSITION APPARATUS

摘要

Provided is an atomic layer deposition apparatus, especially related to an atomic layer deposition apparatus, which uses an embedded control unit integrating functions of display and control as main control component of a control system. The atomic layer deposition apparatus comprises a main control component, an electrical control component, a vacuum component, a heating component and a gas path component, wherein the main control component respectively connects with the electrical control component, the vacuum component, the heating vacuum and the gas path component, the electrical control component respectively connects with the vacuum component, the heating vacuum and the gas path component, and the main control component is a control device integrating functions of display and control. The present invention uses the main control component integrates functions of display and control to replace a traditional control structure of display + industrial computer+ PLC (or control card), which brings simple and clear structure, small occupied space, simple and convenient installation and maintaining, and high reliability to the apparatus, and can effectively avoid accident during operating the apparatus.