发明名称 APPARATUS FOR SUPPLYING CHEMICAL
摘要 PURPOSE: A chemical supply apparatus is provided to accurately control the amount of chemicals inputted to a mixing device by controlling the height of a pipe to supply the chemicals from a chemical measurement unit to the mixing device. CONSTITUTION: A chemical supply unit (200) stores chemicals. A chemical measurement unit (220) measures the chemicals supplied from the chemical supply unit. A first sensor (235) and a second sensor (237) measure the height of the chemicals stored in the chemical measurement unit at different heights. A chemical collection unit (225) collects the chemicals from the chemical measurement unit in the chemical supply unit at the same height as the first sensor. A mixing device (260) mixes the chemicals from the chemical measurement unit. [Reference numerals] (200) Chemical supply unit; (220) Chemical measurement unit; (235) First sensor; (237) Second sensor; (260) Mixing device
申请公布号 KR20130079749(A) 申请公布日期 2013.07.11
申请号 KR20120000420 申请日期 2012.01.03
申请人 LG SILTRON INCORPORATED 发明人 LEE, HO JAE;KIM, BONG GYUN
分类号 H01L21/304;H01L21/02 主分类号 H01L21/304
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