EXPOSURE SYSTEM OF IMPROVED SHUTTER

摘要

PURPOSE: An exposure apparatus with improved shutter opening time is provided to present even dose amount by implementing a new opening and closing method with monotonic passing time of beam projected from an optical source section. CONSTITUTION: An exposure apparatus with improved shutter opening time comprises an optical source section outputting beam, a light exposure part exposing light, and a shutter (100) opening and closing beam projection on the optical path located from the optical source section to the light exposed part. The shutter includes an opening part (110) in the center and moves in a slide type. The optical source section comprises an UV lamp, an elliptical collector, a cold mirror, an integrator and a folding mirror. The light exposed part includes a stage, a substrate chuck and a mask chuck.