| 摘要 |
PURPOSE: A substrate processing device is provided to generate uniform plasma. CONSTITUTION: A substrate processing device includes a lid frame (20), a first antenna (41), a second antenna (45), a plurality of detectors (71,72), and a power distributer (90). The lid frame is combined with a chamber main body (11). The first antenna is formed on a central part of the lid frame. The second antenna is formed on the outside of the first antenna and an edge part of the lid frame. The detectors measure plasma density generated in a chamber. The power distributer controls a power supplied to the first antenna and the second antenna according to the plasma density measured in the detectors. [Reference numerals] (90) Power distributer |
