SILICON POLISHING COMPOSITIONS WITH HIGH RATE AND LOW DEFECTIVITY,申请号EP20110822449-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	SILICON POLISHING COMPOSITIONS WITH HIGH RATE AND LOW DEFECTIVITY
摘要
申请公布号	EP2611878(A2)	申请公布日期	2013.07.10
申请号	EP20110822449	申请日期	2011.08.30
申请人	CABOT MICROELECTRONICS CORPORATION	发明人	WHITE, MICHAEL;ROMINE, RICHARD;REISS, BRIAN;GILLILAND, JEFFREY;JONES, LAMON
分类号	C09K3/14;H01L21/304	主分类号	C09K3/14
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Variable stall-torque electric motor

Electrical characteristics of diodes

Blocking oscillator

Welding method and device

Facsimile transmitter for telegraph message blanks and the like

Purification of lysine

Process for decolorizing hydrogenated butadiene polymers with a saturated carboxylic acid

Process for the production of particulate foamable styrene polymers

Compositions of polycarboxylic acid amides, polyepoxides, and phenolaldehyde condensates

Treating process

Method and apparatus for feeding fluid reactants to a moving bed of solid contact particles

Fatty acid-epichlorohydrin adducts

Granulation of fertilizers

Isomerization of terpenic alcohols

Removing and preventing coke formation in tubular heaters by use of potassium carbonate

Evolving carbon dioxide under pressure for use in the ammonia-soda process

Production of alumina

Packed coupling with deformable rings for relative orientation of the members