| 摘要 |
PURPOSE: A substrate processing device is provided to reduce the asymmetry of plasma generated when a substrate in a chamber is processed. CONSTITUTION: A substrate processing device includes an upper lid (20), a plurality of antennas (41,45), a distribution node (62,64), and an RF power applying unit (50). The upper lid is combined with a lower chamber (11). The antennas are formed on the upper lid and generate an electric field. The distribution node distributes and supplies a power to the antennas. The RF power applying unit applies the power to the distribution node. The distribution node is separated at a constant interval from the center of the upper lid. |
