COMPOSITION FOR HARDMASK, METHOD OF FORMING PATTERNS USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

摘要

PURPOSE: A composition for forming a hard mask, a pattern forming method using the same, and a semiconductor integrated circuit device including the same are provided to improve optical properties and to obtain high etch resistance. CONSTITUTION: A material layer is formed on a substrate. A hard mask layer is formed on the material layer. A thin film layer with silicon is formed on the hard mask layer. A photoresist layer is formed on the thin film layer with the silicon. A photoresist pattern is formed by exposing and developing the photoresist layer.