APPARATUS FOR PROCESSING A SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to uniformly raise the temperature of a target and a substrate. CONSTITUTION: A gas supply part (20) is formed in one side of a process chamber (10). The gas supply part supplies gas to the gas absorbing part. A heating unit (30) is formed in the outside of a chamber body (11). The heating unit includes division units arranged along the major axis of the chamber body. Each division unit comprises at least one infrared lamp.