发明名称 Contact formation of silicon solar cells using conductive ink with nano-sized glass frit
摘要 PURPOSE: A contact formation of silicon solar cells using conductive ink with nano-sized glass frit is provided to minimize the loss of electrode material and to reduce production costs. CONSTITUTION: An emitter layer(202) is formed on the upper part of a substrate. A reflection barrier layer is formed on the emitter layer. A first conductive layer(204) is patterned in the reflection barrier layer. A second conductive layer(205) is formed in the upper surface of the first conductive layer. A conductive ink composite is used in the process for forming the second conductive layer.
申请公布号 KR101283993(B1) 申请公布日期 2013.07.09
申请号 KR20120135577 申请日期 2012.11.27
申请人 发明人
分类号 H01L31/04;H01B1/14;H01L31/0224;H01L31/042 主分类号 H01L31/04
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