发明名称 Dielectric coated metal diffraction grating with high reflection resistance to a femtosecond mode flow
摘要 A reflection metal diffraction grating has a high diffraction efficiency for diffracting femtosecond mode laser pulses, and includes a substrate with a set of lines having a pitch A. The substrate is made of metal or covered with a metal layer, and the grating includes a thin film of dielectric material having a thickness, the dielectric film covering the metal surface of the lines of the grating, the grating being suitable for receiving a pulsed electromagnetic lightwave in a femtosecond mode. The thickness of the dielectric thin film is lower than 50 nm, and is suitable for reducing by a third order factor at least the maximum of the square of the electric field of the electromagnetic lightwave on the metal surface and in the metal layer of the substrate as compared to the square of the electric field at the surface of a metal grating not having a dielectric thin film.
申请公布号 US8482855(B2) 申请公布日期 2013.07.09
申请号 US201013318170 申请日期 2010.04.28
申请人 DESSEROUER FREDERIC;HORIBA JOBIN YVON SAS 发明人 DESSEROUER FREDERIC
分类号 G02B5/18;G02B3/08;H01S3/08 主分类号 G02B5/18
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