发明名称 |
System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules |
摘要 |
A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.
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申请公布号 |
US8481245(B2) |
申请公布日期 |
2013.07.09 |
申请号 |
US201113333109 |
申请日期 |
2011.12.21 |
申请人 |
DAI QING;KERCHER DAN SAYLOR;TZENG HUEY-MING;HGST NETHERLANDS B.V. |
发明人 |
DAI QING;KERCHER DAN SAYLOR;TZENG HUEY-MING |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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