发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
申请公布号 US8482845(B2) 申请公布日期 2013.07.09
申请号 US20100698932 申请日期 2010.02.02
申请人 LOF JOERI;BIJLAART ERIK THEODORUS MARIA;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;DEN BOEF ARIE JEFFREY MARIA;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;VAN DE KERKHOF MARCUS ADRIANUS;KOLESNYCHENKO ALEKSEY YURIEVICH;KROON MARK;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;OTTENS JOOST JEROEN;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR;ASML NETHERLANDS B.V. 发明人 LOF JOERI;BIJLAART ERIK THEODORUS MARIA;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;DEN BOEF ARIE JEFFREY MARIA;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;VAN DE KERKHOF MARCUS ADRIANUS;KOLESNYCHENKO ALEKSEY YURIEVICH;KROON MARK;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;OTTENS JOOST JEROEN;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR
分类号 G02B26/08;G02F1/00;G02F1/29;G03F7/20;H01L21/027 主分类号 G02B26/08
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