STRIPPER COMPOSITION FOR PHOTORESIST AND METHOD OF STRIPPING PHOTORESIST USING THE SAME

摘要

PURPOSE: A photoresist stripper composition is provided to delay the precipitation time of alcohol metal salt strip caused by contact of metal salt of alcohol and moisture and has excellent photoresist removing power and photoresist elimination capacity in repeated processing. CONSTITUTION: A photoresist stripper composition comprises (A) metal salt of alcohol, (B) an aprotic polar organic solvent, and (C) an alcoholometer organic solvent. The weight ratio of (B) the aprotic polar organic solvent against (C) the alcoholometer organic solvent is 8.5-18. The (C)alcoholometer organic solvent is diol with the carbon number 1-10. A method for erasing photoresist includes a step of washing semiconductor substrate with etched patterned object film by using photoresist stripper composition.