SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a support in which measures are taken to improve flatness of an object such as a semiconductor substrate.SOLUTION: The support for the object includes a main body having a surface having a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relatively to the main body at least in a direction in a plane parallel to a main surface of the object.