发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
摘要 <p>PURPOSE: A semiconductor device and a method for manufacturing the same are provided to improve resistance to radioactive ray by using a conductor plug which is formed in a hole and shields most of the radioactive ray. CONSTITUTION: A first insulating layer is formed on a semiconductor substrate. A capacitor is formed on the first insulating layer. A second insulating layer (29) is formed on the capacitor. The second insulating layer includes a hole including the whole area of an upper electrode (22a). A conductor plug (33) includes tungsten.</p>
申请公布号 KR20130076711(A) 申请公布日期 2013.07.08
申请号 KR20120145157 申请日期 2012.12.13
申请人 FUJITSU SEMICONDUCTOR LIMITED 发明人 SASHIDA NAOYA
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
代理机构 代理人
主权项
地址