SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to rapidly raise the temperature of a substrate by appropriately supplying a first and a second gas. CONSTITUTION: A substrate holding part maintains a substrate. A first processing solution nozzle (61) supplies a first processing solution to the periphery part of the substrate. A second processing solution nozzle (62) supplies a second processing solution to the periphery part of the substrate. A first gas supply device (51) supplies a first gas to the periphery part of the substrate. A second gas supply device (42) supplies a second gas to the substrate.