METHOD OF MANUFACTURING PHOTONIC CRYSTAL BANDGAP DEVICE USING WET ETCHING PROCESS
摘要
PURPOSE: A method for manufacturing a photonic crystal band-gap element using a wet etching process is provided to utilize a chemical-mechanical polishing (CMP) process, thereby easily manufacturing the element. CONSTITUTION: A method for manufacturing a photonic crystal band-gap element using a wet etching process includes: a step (105) of bonding two wafers with a metal layer; a step (110) of implementing a chemical-mechanical polishing (CMP) process on the upper wafer, and adjusting the thickness of the upper wafer; a step (120) of forming a mask pattern using a photosensitive etching mask; and a step (125) of implementing a wet etching process on the mask pattern. [Reference numerals] (105) Wafer bonding; (110) Chemical-mechanical polishing; (115) Photonic crystal structure compensating circuit construction; (120) Pattern formation; (125) Preparation through a wet etch process; (AA) Start; (BB) End
申请公布号
KR20130075810(A)
申请公布日期
2013.07.08
申请号
KR20110144056
申请日期
2011.12.28
申请人
KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE
发明人
KIM, JAE HONG;KIM, GEUN JU;KIM, JUNG IL;JEON, SEOK GY;HEO, DU CHANG