发明名称 VERTICAL BJT AND SCR FOR ESD
摘要 PURPOSE: A vertical BJT and SCR for ESD are provided to increase area density by using fin field-effect transistors (FET). CONSTITUTION: A well region is made of a semiconductor material of a first doping type. A floating base (14) is made of a semiconductor material of a second doping type. The floating base is vertically arranged on the well region. A first terminal receiving region (16) is vertically arranged on the floating base. A second terminal receiving region (18) is made of a semiconductor material of a third doping type.
申请公布号 KR20130076663(A) 申请公布日期 2013.07.08
申请号 KR20120024428 申请日期 2012.03.09
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIN WUN JIE;LO CHING HSIUNG;TSENG JEN CHOU
分类号 H01L27/04;H01L29/732 主分类号 H01L27/04
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