发明名称 |
VERTICAL BJT AND SCR FOR ESD |
摘要 |
PURPOSE: A vertical BJT and SCR for ESD are provided to increase area density by using fin field-effect transistors (FET). CONSTITUTION: A well region is made of a semiconductor material of a first doping type. A floating base (14) is made of a semiconductor material of a second doping type. The floating base is vertically arranged on the well region. A first terminal receiving region (16) is vertically arranged on the floating base. A second terminal receiving region (18) is made of a semiconductor material of a third doping type.
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申请公布号 |
KR20130076663(A) |
申请公布日期 |
2013.07.08 |
申请号 |
KR20120024428 |
申请日期 |
2012.03.09 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN WUN JIE;LO CHING HSIUNG;TSENG JEN CHOU |
分类号 |
H01L27/04;H01L29/732 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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