发明名称 METHOD FOR PRODUCING SINGLE CRYSTAL SILICON
摘要 PROBLEM TO BE SOLVED: To provide a method for producing single crystal silicon, whereby the occurrence of dislocation in the single crystal silicon can be reduced when growing the single crystal silicon by a multi-pulling method whereby a plurality of single crystal silicons is pulled up from a raw material melt in the same crucible.SOLUTION: The method for producing single crystal silicon involves producing the single crystal silicon 1 by a multi-pulling method whereby a plurality of single crystal silicons 1 is pulled up from the raw material melt 7 in the same crucible 8 in a chamber by the Czochralski method. The method comprises a step of separating the single crystal silicon from the raw material melt by skipping formation of at least a portion of a tail part of the single crystal silicon 1, wherein the amount of barium added to form a layer on an inner wall of the crucible 8 is controlled so that it falls within a prescribed range.
申请公布号 JP2013133243(A) 申请公布日期 2013.07.08
申请号 JP20110283330 申请日期 2011.12.26
申请人 SILTRONIC AG 发明人 KATO HIDEO;KUBU SHINICHI
分类号 C30B29/06;C30B15/02;C30B15/10 主分类号 C30B29/06
代理机构 代理人
主权项
地址