| 摘要 |
PROBLEM TO BE SOLVED: To easily control a component concentration or a flow rate of simulation gas in a transition period when switching the component concentration or the flow rate without depending on flow rate control by a mass flow controller, and to accurately reproduce desired variation in the component concentration or the flow rate of the simulation gas.SOLUTION: A simulation gas supply apparatus includes: a first gas supply channel 2 for supplying first gas for generating simulation gas whose flow rate is fixed by a flow rate adjustment device 7; a first gas heating part 4 connected to the first gas supply channel 2 and capable of heating the first gas supplied through the first gas supply channel 2; and a simulation gas supply channel 6 for supplying simulation gas generated by heating the first gas by the first gas heating part 4 to a test object. The first gas supply channel 2 includes a supply branch channel 21 for supplying the first gas to the first gas heating part 4, an exhaustion branch channel 22 for exhausting the first gas to the outside and a switching valve mechanism 23 for selectively switching the first gas between the supply branch channel 21 and the exhaustion branch channel 22. A flow rate of the first gas to be supplied to the first gas heating part 4 is adjusted by allowing the first gas to intermittently flow to the supply branch channel 21 by the switching valve mechanism 23. |
