| 摘要 |
PROBLEM TO BE SOLVED: To suppress the plasma potential by reducing the effective inductance of an antenna in an induction coupling plasma processing apparatus, and to generate plasma of larger area having two-dimensional plasma density distribution of high uniformity.SOLUTION: An antenna 30 having a straight planar shape comprises reciprocating conductors 31, 32 which are arranged to be close each other in a vertical direction Z. High frequency currents Iflow in the reciprocating conductors 31, 32 in a reverse direction with each other. An interval D in the vertical direction Z between the reciprocating conductors 31, 32 is made small in the central part of the antenna in the longitudinal direction X, and made large at both ends. A plurality of such antennas 30 are arranged in parallel. A length N of a region Ahaving a small interval D in the central part of each antenna is made large in the central part of the arrangement direction Y, and made small at both ends. |
