发明名称 POWER DEVICES AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A power device and a method for manufacturing the same are provided to reduce leakage current by forming a regrowth GaN layer in a silicon carbide layer. CONSTITUTION: A silicon carbide layer (210) is formed on one surface of a substrate. A part of the silicon carbide layer is etched. A regrowth GaN layer is grown on an etched part. A first electrode (400) is formed on the silicon carbide layer. A second electrode (500) is formed on the other surface of the substrate.</p>
申请公布号 KR20130076314(A) 申请公布日期 2013.07.08
申请号 KR20110144859 申请日期 2011.12.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JAE HOON;KIM, KI SE
分类号 H01L29/872;H01L29/737 主分类号 H01L29/872
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