SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to quickly freeze a liquid layer when the temperature of a cooling gas is high and to reduce cooling costs. CONSTITUTION: A substrate holding unit maintains a substrate. A liquid supplying part (31,32) supplies a supercooled liquid to one main surface of a substrate. A substrate rotation device (5) forms a liquid layer on the one main surface. A freeze part (4) cools and freezes the liquid layer. A pipe supplies a cooling gas to a cooling gas nozzle. [Reference numerals] (8) Control part