| 摘要 |
PROBLEM TO BE SOLVED: To improve cleaning performance of a gas cleaning apparatus that cleans an exhaust gas including environmental contaminants.SOLUTION: The gas cleaning apparatus is provided with a partition plate 4 partitioning a space formed above a water tank 3 into a first chamber R1 in which the exhaust gas flows and a second chamber R2 communicating with a gas exhaust port 16c and configured to put the lower end part of a partition plate 4 in a cleaning liquid W, and also provided with differential pressure generation means of generating differential pressure between the first and second chambers R1, R2 and configured to clean the exhaust gas again on the second chamber side by moving the cleaning liquid W through a communication part formed below the partition plate 4 according to generation of the differential pressure, pushing up a second liquid level H2 in the second chamber R2 while lowering a first liquid level H1 in the first chamber R1 down to the position of the communication part, and then guiding the exhaust gas flowing in the first chamber and cleaned into the cleaning liquid on the second chamber side through the communication part below the partition plate. |
