| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a substrate having a microhole, in which the reliability of the formation of a modified zone is improved and to provide a substrate having a microhole obtained thereby.SOLUTION: The method for producing a substrate having a microhole, includes a modification step of applying laser light L having a pulse width on the order of picoseconds or shorter into the inside of a substrate 1 and scanning the laser light L so that the focus regions F of the respective pulses of the laser light L overlap each other at least partially to form a modified zone 2 of lowered etching resistance in the region passed by the focus regions F, and an etching step of forming a microhole by etching the modified zone 2, wherein the pulse pitch is ≥0.001 μm and <0.08 μm, and the angle formed between the optical axis of the laser light L and the scanning direction of the focus regions F of the laser L inside the substrate 1 is 3-90 degrees. Here, the pulse pitch (μm)={the scanning speed (μm/sec) of the laser light}/{the repetition frequency (Hz) of the laser light}. |
