发明名称 MOS TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To improve a withstand voltage of an LDMOS transistor while separating a source and a sub-electrode portion.SOLUTION: A MOS transistor includes: a p-type drain 30 provided in a Drain-P-well of a semiconductor substrate; a p-type source 40 provided in a Body-N-well adjacent to the Drain-P-well; a gate 20 provided on the semiconductor substrate ao as to straddle between end portions of the Drain-P-well and the Body-N-well; an n-type sub-electrode portion 50 provided more apart from the gate 20 than the source 40 in the Body-N-well; a first separation portion 61 provided in the Drain-P-well and separating the gate 20 and a drain 30; and a second separation portion 70 provided on the semiconductor substrate so as to separate the source 40 and the sub-electrode portion 50.
申请公布号 JP2013135188(A) 申请公布日期 2013.07.08
申请号 JP20110286473 申请日期 2011.12.27
申请人 RENESAS ELECTRONICS CORP 发明人 TODA TAKESHI
分类号 H01L21/336;H01L21/8234;H01L21/8238;H01L27/088;H01L27/092;H01L29/78 主分类号 H01L21/336
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