| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad containing minute air bubbles almost uniform in thickness direction and provided with an opening part already without requiring an opening process such as surface grinding, and a method of manufacturing the same.SOLUTION: The method of manufacturing a polishing pad includes a step (1) in which a mixture solution containing polyurethane resin and organic solvent is applied on a film forming base material, a step (2) in which the polyurethane resin is, after the application step, exposed to the atmosphere of temperature of 10-80°C and relative humidity of 65-100% for two minutes or longer, and a step (3) in which the polyurethane resin is submerged in congealing liquid for coagulation. |
