| 摘要 |
PURPOSE: An apparatus for processing plasma is provided to minimize polymer adhesion caused by a low temperature in a center area inside a chamber by arranging a plurality of heating members in a center area of a lead frame. CONSTITUTION: A heating member(240) includes an elastic body(241) having an hallow hole. The elastic body is made of engineering plastic. The heating member includes a metal RF shield cover(242) covering the elastic body and a heating cartridge inserted into the hollow hole of the elastic body. Each temperature of heating cartridges can be controlled individually. The heating cartridge includes a heating wire formed inside thereof. A center area of a lead frame is heated through the heating member. A lead includes the lead frame formed into a grid format, a ceramic window installed at an upper portion of the lead frame, and an antenna(230) installed at an upper portion of the window. |
