| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of suppressing generation of a residue during development, that is, excellent in developing property, and showing good contrast, and to provide a manufacturing method of a patterned cured film using the photosensitive resin composition, and an electronic component having the patterned cured film.SOLUTION: The photosensitive resin composition comprises (A) an alkali-soluble resin having a phenolic hydroxyl group, (B) a compound that generates acid with light, (C) a thermal crosslinking agent, and (D) a phenolic low molecular compound. |
