EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure method and a device manufacturing method capable of more accurately exposing a pattern of a target linewidth to a substrate.SOLUTION: An exposure method for projecting a pattern image onto a substrate at a prescribed projection magnification via a projection optical system and exposing a first pattern that has a first linewidth to the substrate comprises the steps of: setting a mask including a second pattern that has a second linewidth greater than the value obtained by dividing the first linewidth by the size of the projection magnification in the projection optical system; calculating exposure conditions for exposing an image of the second pattern that has the first linewidth by the projection optical system on the basis of the first linewidth and the second linewidth; and exposing the image of the second pattern formed in the mask set in the projection optical system to the substrate via the projection optical system under the exposure conditions calculated on the basis of the first linewidth and the second linewidth.