ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME

摘要

PURPOSE: An additive for resist is provided to suppress a leaching from the water during the exposure process of immersion lithography and form a fine resist pattern having an excellent sensitivity and resolution. CONSTITUTION: An additive for resist is a copolymer in which a polystyrene conversion weight-average molecular weight by a gel permeation chromatography is 1,000-500,000 g / mol, and indicated as below chemical formula 1. A ratio of weight-average molecular weight and a number average molecular weight in the additive for resist is 1-5. Moreover, the resist composition comprises the additive for resist, a base copolymer for resist, and an acid generator, and solvent. The additive is included to amount of 0.05-5 weight% compare to the total weight of the resist composition. The acid generator is included to amount of 0.3-10 parts by weight compare to the solid content of the resist composition of 100.0 parts by weight.