发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A semiconductor device and a method for manufacturing the same are provided to secure stable electrical characteristics by using oxide semiconductor. CONSTITUTION: A gate insulating layer is arranged on a gate electrode layer. An oxide semiconductor layer (403) is arranged on the gate insulating layer. A source electrode layer (405a) is electrically connected to the oxide semiconductor layer. A drain electrode layer (405b) is electrically connected to the oxide semiconductor layer. A metal oxide layer is contacted with the upper part of an insulating layer. |
申请公布号 |
KR20130075657(A) |
申请公布日期 |
2013.07.05 |
申请号 |
KR20120145061 |
申请日期 |
2012.12.13 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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