发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A semiconductor device and a method for manufacturing the same are provided to secure stable electrical characteristics by using oxide semiconductor. CONSTITUTION: A gate insulating layer is arranged on a gate electrode layer. An oxide semiconductor layer (403) is arranged on the gate insulating layer. A source electrode layer (405a) is electrically connected to the oxide semiconductor layer. A drain electrode layer (405b) is electrically connected to the oxide semiconductor layer. A metal oxide layer is contacted with the upper part of an insulating layer.
申请公布号 KR20130075657(A) 申请公布日期 2013.07.05
申请号 KR20120145061 申请日期 2012.12.13
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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