| 摘要 |
PURPOSE: A substrate processing apparatus is provided to electrically connect a shower head to the inner wall of a chamber by installing a connection member in the outer side of a liner, thereby generating uniform plasma in a wide area. CONSTITUTION: A substrate supporting unit(300) supports a substrate(S) in a chamber(100). The substrate supporting unit includes a substrate mounting part(310), a shaft(320), and a driver(330). A shower head(200) faces the substrate mounting part and sprays raw material to the substrate. A connection member(600) electrically connects the inner wall of the chamber to the shower head to extend the ground area of the chamber. A power supply part(420) applies RF power to the substrate supporting unit. A liner(500) surrounds the outer surface of the shower head. [Reference numerals] (AA) Plasma; |
