SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A substrate processing apparatus and a method for manufacturing a semiconductor device are provided to facilitate a maintenance operation and to prevent the adsorption of a non-reactive gas in a pipe. CONSTITUTION: A main part is arranged in a container body. A pod stage (18) is arranged in the front surface of the container body. A pod (16) is transferred to the pod stage. The pod receives a wafer. A pod transfer device (20) faces the pod stage.