EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To achieve high throughput.SOLUTION: An exposure device EX includes: an illumination system IS and a projection system PS that transfer a pattern including an alignment mark on a substrate P; a substrate stage 2 that moves the substrate P in a scanning direction while holding the substrate P; a first alignment system that measures a position of the alignment mark transferred on the substrate P; a second alignment system that is disposed at a position different from the first alignment system and measures a position of the alignment mark transferred on the substrate P; and a control device 5 that controls a correction value for correcting results of measuring by the first alignment system and the second alignment system in a subsequent process, using the result of measuring by the first alignment system in a preceding process.