| 摘要 |
A silicon wafer-based solar cell with a two-layer antireflective coating (ARC) combines a 10-30 nm thick hydrogen containing passivation layer (e.g. SiXNY:H) with a top layer of Nb2O5 (or NbXOY in general) for optimal matching the refractive index of the ARC to cover materials having a refractive index of about 1.5 (e.g. glass or EVA, Ethylene Vinyl Acetate). The two-layer ARC can be deposited either by PECVD or by reactive sputtering (PVD) of a Si target with N2 and/or NH3, and the Nb2O5 layer is deposited by reactive sputtering of either a pure Nb target or a conductive Nb2Ox (x<5) target with O2.
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