| 摘要 |
<p>The present invention proposes a chemical mixer that can supply a chemical mixture to a substrate treating device without degradation over time, and can suppress variations in a mixing ratio for sulfuric acid and hydrogen peroxide and produce a chemical mixture that maintains a constant mixing ratio when producing a chemical mixture. In a chemical mixer (10), a sulfuric acid flow rate is stabilized by pressure feeding the sulfuric acid by a pressure feeding means (35), and also a hydrogen peroxide flow rate is stabilized by injecting the hydrogen peroxide with a supply rate lower than that of the sulfuric acid using a metering pump (38) in a fixed small amount. The mixture is produced from the sulfuric acid and hydrogen peroxide in an interflow part (105), and the chemical mixture is supplied to a substrate treating device (1) as is, directly after production. Thus, the chemical mixture can be supplied to the substrate treating device (1) without degradation over time, and variations in the mixing ratio for the sulfuric acid and hydrogen peroxide can be suppressed when producing the chemical mixture, allowing for production of a chemical mixture in which a fixed mixing ratio is maintained.</p> |
