发明名称 A THIN FILM TRANSISTOR AND A MAKING METHOD THEREOF
摘要 <p>PURPOSE: A thin film transistor and a method for manufacturing the same are provided to improve field effect mobility and optimize threshold voltage. CONSTITUTION: A gate electrode (110) is formed on a substrate. A gate dielectric layer (120) covering the gate electrode is formed on the substrate. A channel layer (130) is formed on the gate dielectric layer. An etch stop layer (140) is formed on the channel layer. A first electrode (155a) is formed in one side of the channel layer and the gate electrode. A second electrode (155b) is formed in the other side of the channel layer and the gate electrode.</p>
申请公布号 KR20130074523(A) 申请公布日期 2013.07.04
申请号 KR20110142616 申请日期 2011.12.26
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 YUN, IL GU;KIM, CHANG EUN
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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