A THIN FILM TRANSISTOR AND A MAKING METHOD THEREOF
摘要
<p>PURPOSE: A thin film transistor and a method for manufacturing the same are provided to improve field effect mobility and optimize threshold voltage. CONSTITUTION: A gate electrode (110) is formed on a substrate. A gate dielectric layer (120) covering the gate electrode is formed on the substrate. A channel layer (130) is formed on the gate dielectric layer. An etch stop layer (140) is formed on the channel layer. A first electrode (155a) is formed in one side of the channel layer and the gate electrode. A second electrode (155b) is formed in the other side of the channel layer and the gate electrode.</p>
申请公布号
KR20130074523(A)
申请公布日期
2013.07.04
申请号
KR20110142616
申请日期
2011.12.26
申请人
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY