SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to rapidly and uniformly cool a substrate by uniformly supplying gases to convert the inside of a load lock chamber from a vacuum state to an atmospheric pressure state. CONSTITUTION: A chamber provides a space for processing a substrate. A gas spray unit (200) sprays gases to a substrate support unit. The gas spray unit contacts one side of a body (202) with an inner wall of the chamber. A groove (204) is formed on one side of the body. The gas spray unit includes a plurality of gas spray holes (206) which are regularly arranged along a gas flow path.