发明名称 |
METHOD FOR MANUFACTURING SINGLE-CRYSTAL SILICON |
摘要 |
Subject: There is provided a method for manufacturing single- crystal silicon that makes it possible to reduce occurrence of dislocation of the single-crystal silicon when the single- crystal silicon is grown using a multi-pulling method for pulling up a plurality of pieces of single-crystal silicon from a material melt in an identical crucible. Solving Means: A method for manufacturing single-crystal silicon is directed to a method for manufacturing a single- crystal silicon 1 using the multi-pulling method for pulling up a plurality of pieces of single-crystal silicon 1 from a material melt 7 in an identical crucible 8 within a chamber by a Czochralski method, the method including the step of growing single-crystal silicon 1 in a magnetic field, wherein an amount of addition of barium formed on an inner wall of large-diameter crucible 8 is controlled within a certain range. |
申请公布号 |
WO2013097951(A1) |
申请公布日期 |
2013.07.04 |
申请号 |
WO2012EP59017 |
申请日期 |
2012.05.15 |
申请人 |
SILTRONIC AG;KATO, HIDEO;KYUFU, SHINICHI;OHKUBO, MASAMICHI |
发明人 |
KATO, HIDEO;KYUFU, SHINICHI;OHKUBO, MASAMICHI |
分类号 |
C30B15/10;C03B19/09;C30B29/06;C30B35/00 |
主分类号 |
C30B15/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|