发明名称 METHOD FOR MANUFACTURING SINGLE-CRYSTAL SILICON
摘要 Subject: There is provided a method for manufacturing single- crystal silicon that makes it possible to reduce occurrence of dislocation of the single-crystal silicon when the single- crystal silicon is grown using a multi-pulling method for pulling up a plurality of pieces of single-crystal silicon from a material melt in an identical crucible. Solving Means: A method for manufacturing single-crystal silicon is directed to a method for manufacturing a single- crystal silicon 1 using the multi-pulling method for pulling up a plurality of pieces of single-crystal silicon 1 from a material melt 7 in an identical crucible 8 within a chamber by a Czochralski method, the method including the step of growing single-crystal silicon 1 in a magnetic field, wherein an amount of addition of barium formed on an inner wall of large-diameter crucible 8 is controlled within a certain range.
申请公布号 WO2013097951(A1) 申请公布日期 2013.07.04
申请号 WO2012EP59017 申请日期 2012.05.15
申请人 SILTRONIC AG;KATO, HIDEO;KYUFU, SHINICHI;OHKUBO, MASAMICHI 发明人 KATO, HIDEO;KYUFU, SHINICHI;OHKUBO, MASAMICHI
分类号 C30B15/10;C03B19/09;C30B29/06;C30B35/00 主分类号 C30B15/10
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