发明名称 |
APPARATUS FOR REMOVING PARTICLE AND APPARATUS FOR PROCESSING SUBSTRATE USING THE SAME |
摘要 |
PURPOSE: A particle removing device and a substrate processing apparatus using the same are provided to reduce maintenance and repair costs by extending a replacement period of a filter to remove particles. CONSTITUTION: A housing (110) includes a cover (112) and a body (111) combined with the cover. An exhaust port (117) is formed in the body to discharge a gas from the housing to the outside. A filter (120) is arranged in the housing. A diffusion plate (130) is combined with one end of the filter facing an inhalation hole (114). The diffusion plate prevents the gas from being inputted to a hollow part (121) of the filter from the housing.
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申请公布号 |
KR20130074526(A) |
申请公布日期 |
2013.07.04 |
申请号 |
KR20110142621 |
申请日期 |
2011.12.26 |
申请人 |
LIGADP CO., LTD. |
发明人 |
JEONG, JIN YEOL;KIM, YONG JIN;LEE, BYOUNG CHAN;LEE, CHANG YEOB |
分类号 |
H01L21/02;H01L21/203;H01L21/205 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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