发明名称 METHOD FOR PRODUCING POLYCRYSTALLINE SILICON INGOT
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a large-size polycrystalline silicon ingot capable of reducing a crystal defect density or preventing a crack easily and inexpensively, and to provide a polycrystalline silicon ingot obtained thereby, and application thereof.SOLUTION: In this method for producing a polycrystalline silicon ingot by unidirectionally solidifying molten silicon in a crucible upward from the bottom of the crucible, the molten silicon is unidirectionally solidified to obtain the polycrystalline silicon ingot under such conditions that, while the temperature Tm detected when the silicon temperature agrees with the melting point of the silicon, at a position in the vicinity of the center of the under surface of the crucible falls from (Tm-20)°C to (Tm-60)°C, there is a period during which the temperature falls at a temperature changing rate of 1-10°C/hr.
申请公布号 JP2013129580(A) 申请公布日期 2013.07.04
申请号 JP20110281750 申请日期 2011.12.22
申请人 SHARP CORP 发明人 OISHI RYUICHI;UENO KAZUYA;KAJIMOTO KIMIHIKO
分类号 C01B33/02;C30B29/06;H01L31/04 主分类号 C01B33/02
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