| 摘要 |
PROBLEM TO BE SOLVED: To provide a small-sized wavelength distribution measuring apparatus having improved measurement accuracy with uniformed luminance distribution of light flux radiated from an object measurement area.SOLUTION: A wavelength distribution measuring apparatus 24 includes a light flux uniforming element 53 which uniforms the light flux radiated from an object 11 to be measured and a light receiving part 56 having a plurality of photodetectors 56a with different spectral sensitivity properties from each other. The light flux uniforming element 53 includes an incidence plane 53a to which the light flux is injected, an emission plane 53c from which the incident light flux from the incidence plane 53a is emitted toward the light receiving part 56, and a side face 53b which internally reflects the light flux injected from the incidence plane 53a. The light flux uniforming element 53 further includes a volume scattering material which internally scatters the light flux. |
